Properties and Processing of Vapor-Deposited Coatings: Volume 555Roger N. Johnson Cambridge University Press, 27 Απρ 1999 - 427 σελίδες This book focuses on advances associated with generating processing-microstructure-property-performance relationships of coatings produced by chemical vapor deposition (CVD) and physical vapor deposition (PVD) methods. Various coating materials and applications are discussed, ranging from producing high-quality diamond coatings to developing large-scale or novel diamond-like carbon (DLC) processes, understanding metal-ceramic interface adhesion behavior in thermal barrier coatings, identifying corrosion-resistant ceramic coating materials for high-temperature structural applications, and preparing polymeric thin films for integrated circuits. Rapid advances in industrial process scale-up and the development of a large-scale DLC coating chamber, based on a novel process concept called 'plasma ion immersion process,' is presented. Progress in understanding the reaction kinetics, particularly gas phase chemistry, of complex CVD processes is noted. Overall, the book clearly shows that vapor-deposited coatings are being actively pursued for diverse technological benefits, and that the coating community is increasingly relying on generating appropriate processing-microstructure-property relationships to guide integrated coating process and product development. |
Περιεχόμενα
Multilayer Coatings and Optical Materials for Tuned | 3 |
Deposition of Epitaxial Carbide Films and Superlattices | 13 |
MetalSilicon Multilayers Produced by LowTemperature MOCVD | 19 |
Πνευματικά δικαιώματα | |
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Άλλες εκδόσεις - Προβολή όλων
Properties and Processing of Vapor-Deposited Coatings: Volume 555 Roger N. Johnson Προβολή αποσπασμάτων - 1999 |
Συχνά εμφανιζόμενοι όροι και φράσεις
absorption adhesion amorphous annealing Appl applications atoms band bonds boron carbide cathode ceramic chamber chemical vapor deposition chromia cm¹ CNx:Cl coatings composition concentration crystalline crystallites density deposited films deposition rate deposition temperature diamond films diamond-like carbon DLC films electron energy epitaxial etching experimental Figure films deposited films grown flow rate formation FTIR gas pressure gas-phase graphite growth rate higher hydrogen increase infrared interface laser layer Lett materials measured mechanical metal methane method mixture mullite multilayer nitride nitrogen nucleation observed optical oxidation oxygen paracyclophane parameters peak PECVD phase Phys plasma precursor properties Raman ratio reaction reactive reactor refractive index samples sccm shown shows silicon silicon nitride SiO2 sp² sp² bonded sp³ species spectra spectroscopy spectrum sputtering stoichiometry stress structure substrate substrate temperature surface susceptor thermal thin films Torr wafer wavelength X-ray zirconium zirconium carbide zirconium tetrachloride